Registration starts at 9 am

Talks session:

10.00 – 10.20 Julian Schulze, West Virginia University, “Process Optimization by voltage waveform tailoring in technological plasmas: experiments, simulations, and modeling”
10.20 – 10.40 Peter Ventzek, Tokyo Electron, “A perspective on the requirements for the integration of process through to device modeling and simulation”

10.40 – 10.50 Coffee break

10.50 – 11.10 Mark Kushner, Michigan University, “Coupling of scales in modelling of semiconductor manufacturing”
11.10 – 11.30 Jean-Paul Booth, Ecole Polytechnique, “Inductively-coupled plasmas in Cl2 and O2 : Comparing HPEM with advanced diagnostic measurements”
11.30 – 11.50 Jonathan Tennyson, University College London, “Plasma chemistry data for industrial manufacturing modelling”

11.50 – 12.00 Coffee break

12.00 – 12.20 Sebastian Mohr, Quantemol, “Q-VT modelling of plasma processing on reactor scale”
12.20 – 12.40 Mohamed Oulmane, Synopsys, “Sentaurus Topography 3D: Particle MC surface reaction feature scale modeling and link to HPEM plasma simulation output data “

12.40 – 13.30 Lunch

Hands-on session:

13.30 – 13.50 introduction to Quantemol-VT, how to use it and proposed test case to work with; and Q-N introduction for those interested

13.50 – 14.20 time to do Q-VT/Q-N test cases and ask questions

14.20 – 14.30 Coffee break

14.30 – 14.50 introduction to Synopsys TCAD Sentaurus software and test case examples how to use it

14.50 – 15.30 time to work with Sentaurus + Q-VT

15.30 – 17.00 Closing drinks session

Quantemol Workshop: Linking Simulation with Experiment