A better understanding of monitoring key airborne contaminants is critical to improved manufacturing in a cleanroom environment. Speakers from research groups and industry will outline how laser techniques can be used to monitor trace contaminant levels and also discuss the generation, sampling and handling of airborne chemical contaminants
Preliminary programme (20-minute talks + 5-minute questions)
10:00 Arrival and microphone check
10:10 Welcome
Tuomas Hieta, Gasera and Geoffrey Barwood, NPL
Introduction
10:30 “Airborne chemical contamination and the link to process failure”
Markus Keller, (Fraunhofer IPA)
10:55 “Relationship between AMCs and yield from an industrial perspective”
Hugh E. Gotts, Air Liquide Electronics U. S. LP – (Balazs Analytical Services)
Airborne chemical contamination measurement technology
11:20 “Overview of AMC measurement technologies and trends”
Graham Leggett, (LI-COR Biosciences)
11:45 “Laser-spectrometric AMC detection – methods, uncertainties, and metrological traceability” - (PTB)
12:10 40-minute lunch break
12:50 “AMC Monitoring - From Lab to Fab”
Jens Herbig, (IONICON)
13:25 “NICE-OHMS: Frontiers in optical gas sensing”
Anne Curtis, (NPL)
Generating, sampling and handling of airborne chemical contaminants
13:50 “Reliable generation and sampling of AMCs” – (NPL)
14:15 15-minute coffee break
14:30 “Preparation and sampling methods for metrological traceability of measurements of HCl and HF”
Heleen Meuzelaar, VSL
14:55 “Measuring HF, NH3 and HCl in clean rooms”
Timo Rajamäki, VTT / OPTOSEVEN
15:20 Closing Remarks
